The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

• Victor Deinhart,
• Lisa-Marie Kern,
• Jan N. Kirchhof,
• Sabrina Juergensen,
• Joris Sturm,
• Enno Krauss,
• Thorsten Feichtner,
• Sviatoslav Kovalchuk,
• Michael Schneider,
• Dieter Engel,
• Bastian Pfau,
• Bert Hecht,
• Kirill I. Bolotin,
• Stephanie Reich and
• Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

• typically described with a Gaussian profile in He ion microscopy [27]. It has to be mentioned that the beam parameters for a gas field ion source (GFIS) are strongly correlated and, thus, not independently adjustable. Due to the extremely small size of the source typical currents are only in the range of

Imaging of SARS-CoV-2 infected Vero E6 cells by helium ion microscopy

• Natalie Frese,
• Patrick Schmerer,
• Martin Wortmann,
• Matthias Schürmann,
• Matthias König,
• Michael Westphal,
• Friedemann Weber,
• Holger Sudhoff and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2021, 12, 172–179, doi:10.3762/bjnano.12.13

• electrons to excite and detect secondary electrons from the sample surface. Due to the high brightness and low energy spread of its atomically sharp gas field ion source, the smallest attainable focused spot size is about 0.3 nm [22]. With its significantly smaller convergence angle compared to SEM, HIM

Bio-imaging with the helium-ion microscope: A review

• Matthias Schmidt,
• James M. Byrne and
• Ilari J. Maasilta

Beilstein J. Nanotechnol. 2021, 12, 1–23, doi:10.3762/bjnano.12.1

• HIM this is realised by the atomic level (or gas field) ion source, which, in essence, is a single tungsten atom at which the gas atoms are ionised [1][39]. The column optics projects an image of that atom onto the sample, which commonly is referred to as “beam spot”. The achievable lateral resolution

Scanning transmission imaging in the helium ion microscope using a microchannel plate with a delay line detector

• Eduardo Serralta,
• Nico Klingner,
• Olivier De Castro,
• Michael Mousley,
• Santhana Eswara,
• Serge Duarte Pinto,
• Tom Wirtz and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2020, 11, 1854–1864, doi:10.3762/bjnano.11.167

• information. Therefore, the user can generate BF, ADF, or other DF images through post-processing the transmission data at will at any time. The experiments were conducted using the npSCOPE prototype, which is a high-vacuum instrument based on the gas field ion source (GFIS) column technology. This instrument

Imaging and milling resolution of light ion beams from helium ion microscopy and FIBs driven by liquid metal alloy ion sources

• Nico Klingner,
• Gregor Hlawacek,
• Paul Mazarov,
• Wolfgang Pilz,
• Fabian Meyer and
• Lothar Bischoff

Beilstein J. Nanotechnol. 2020, 11, 1742–1749, doi:10.3762/bjnano.11.156

• resolution of Ne+ from a gas field ion source. The comparison allows one to select the best possible ion species for the specific demands in terms of resolution, beam current, and volume to be drilled. Keywords: focused ion beam; gas field ion source; liquid metal alloy ion source; resolution; Introduction

• resolution. This mass range is of interest due to the interaction of the ions with the near-surface region and, among other use cases, the application of these ions for indirect or resist-aided lithography [3]. The introduction of the helium ion microscope (HIM) [4], working with a gas field ion source (GFIS

Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams

• Serguei Chiriaev,
• Luciana Tavares,
• Vadzim Adashkevich,
• Arkadiusz J. Goszczak and
• Horst-Günter Rubahn

Beilstein J. Nanotechnol. 2020, 11, 1693–1703, doi:10.3762/bjnano.11.151

• interest within diverse fields of materials science and technology [1]. In recent years, the capabilities of FIBs have been substantially enhanced leading to a broad range of applications by the implementation of light ion beams (He+ and Ne+) emitted by a gas field ion source (GFIS). This has enabled

Helium ion microscope – secondary ion mass spectrometry for geological materials

• Matthew R. Ball,
• Richard J. M. Taylor,
• Joshua F. Einsle,
• Fouzia Khanom,
• Christelle Guillermier and
• Richard J. Harrison

Beilstein J. Nanotechnol. 2020, 11, 1504–1515, doi:10.3762/bjnano.11.133

• focussed ion beam (FIB) instrument, which uses a gas field ion source (GFIS) to create highly focussed beams of noble gas ions, utilising the same working principle as the field ion microscope (FIM). This was originally used to form a primary helium beam [1], but the principle of the GFIS has since been

• –SIMS for geological materials are also provided. Results and Discussion Methods All analyses were performed using an ORION NanoFab HIM with an attached V500 double focussing magnetic sector mass spectrometer [14]. The gas field ion source (GFIS) of the ORION instrument produces a highly focussed single

Stationary beam full-field transmission helium ion microscopy using sub-50 keV He⁺: Projected images and intensity patterns

• Michael Mousley,
• Santhana Eswara,
• Olivier De Castro,
• Olivier Bouton,
• Nico Klingner,
• Christoph T. Koch,
• Gregor Hlawacek and
• Tom Wirtz

Beilstein J. Nanotechnol. 2019, 10, 1648–1657, doi:10.3762/bjnano.10.160

• diffraction; ion scattering; transmission ion microscopy; Introduction The use of helium ions for microscopy and nanoanalysis is gaining popularity due to the availability of the high-brightness gas field ion source (GFIS) [1]. Due to the high brightness, the probe from a GFIS can be focused into a spot of

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• of the much lighter and less damaging 4He+ ion. ALIS is a highly developed version of the gas field ion source (GFIS), the operation of which is shown schematically in Figure 1 [23][24]. The non-uniform high electric field at the atomically sharp tip of a tungsten needle maintained at cryogenic

Defect formation in multiwalled carbon nanotubes under low-energy He and Ne ion irradiation

• Santhana Eswara,
• Jean-Nicolas Audinot,
• Brahime El Adib,
• Maël Guennou,
• Tom Wirtz and
• Patrick Philipp

Beilstein J. Nanotechnol. 2018, 9, 1951–1963, doi:10.3762/bjnano.9.186

• beams in an Orion Nanofab Instrument (Zeiss) [33]. The He+ and Ne+ ions generated in the gas-field ion source (GFIS) column were accelerated to 25 keV with a primary current from 15 pA to 45 pA. The beam at normal incidence was raster scanned over a surface of 40 × 40 µm2 to 60 × 60 µm2 (Figure 8) for

Ion beam profiling from the interaction with a freestanding 2D layer

• Ivan Shorubalko,
• Kyoungjun Choi,
• Michael Stiefel and
• Hyung Gyu Park

Beilstein J. Nanotechnol. 2017, 8, 682–687, doi:10.3762/bjnano.8.73

• measure Ga beam profiles in dual-beam systems. As the next step, we perform similar experiments with the helium focused ion beam. He FIB has several conceptual differences compared to the Ga FIB. It is based on a gas-field ion source (GFIS) that is disparate from a liquid metal ion source for gallium

Nano-structuring, surface and bulk modification with a focused helium ion beam

• Daniel Fox,
• Yanhui Chen,
• Colm C. Faulkner and
• Hongzhou Zhang

Beilstein J. Nanotechnol. 2012, 3, 579–585, doi:10.3762/bjnano.3.67

• microscope (HIM) is a new type of focused ion beam microscope. The HIM uses helium ions instead of gallium ions. Helium ions have a lower mass and therefore are less destructive than gallium ions. Helium ions are effectively non-contaminating. The source is a gas field ion source which does not suffer the